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1

Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists

Tarumoto, Naohiro, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

2005

File:

PDF, 326 KB

2005

2

Diphenyliodonium Salts with Pyranine Conk as an Environment-friendly Photo-acid Generator and Their Applications to Chemically Amplified Resists

Tarumoto, Naohiro, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo

Journal:

Polymer Journal

Year:

2005

Language:

english

File:

PDF, 1.07 MB

english, 2005

3

Diphenyliodonium Salts with Diazoxide Group for a Photo-acid Generator in Chemically Amplified Resist.

Tarumoto, Naohiro, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 570 KB

2003

4

Preparation and properties of positive photosensitive polyimides containing o-naphthoquinonediazide in the polymer side chains.

Mochizuki, Hideaki, Omote, Toshihiko, Koseki, Ken'ichi, Yamaoka, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

1989

Language:

english

File:

PDF, 89 KB

english, 1989

5

Diphenyliodonium Salts with Environment-friendly Dye for a Photo-acid Generator in Chemically Amplified Resist

Tarumoto, Naohiro, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo

Journal:

Polymer Journal

Year:

2004

Language:

english

File:

PDF, 105 KB

english, 2004

6

Novel dual-mode photoresist based on decarboxylation by photogenerated base compound

Soyoung Song, Shoichi Yokoyama, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

1998

Language:

english

File:

PDF, 375 KB

english, 1998

7

Study of the crosslinking of polyvinyl alcohol by light-sensitive tetrazonium salts

Takahiro Tsunoda, Tsuguo Yamaoka

Journal:

Journal of Applied Polymer Science

Year:

1964

Language:

english

File:

PDF, 473 KB

english, 1964

8

N-phenylglycine-(thio)xanthene dye photoinitiating system and application to photopolymer for visible laser exposure

Tsuguo Yamaoka, Yu-Chuan Zhang, Ken'ichi Koseki

Journal:

Journal of Applied Polymer Science

Year:

1989

Language:

english

File:

PDF, 666 KB

english, 1989

9

An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate-co-methacrylic acid)

Kazuhiko Naitoh, Ken'ichi Koseki, Tsuguo Yamaoka

Journal:

Journal of Applied Polymer Science

Year:

1993

Language:

english

File:

PDF, 724 KB

english, 1993

10

A photochromic memory with a non-destructive read-out property

Nobuyuki Tamaoki, Sawako Yoshimura, Tsuguo Yamaoka

Journal:

Thin Solid Films

Year:

1992

Language:

english

File:

PDF, 1.45 MB

english, 1992

11

A novel positive resist for deep UV lithography

Tsuguo Yamaoka, Masashi Nishiki, Ken'Ichi Koseki, Mitsunobu Koshiba

Journal:

Polymer Engineering & Science

Year:

1989

Language:

english

File:

PDF, 208 KB

english, 1989

12

Study of the orientation of light-sensitive tetrazonium salt in poly(vinyl alcohol)

Takahiro Tsunoda, Tsuguo Yamaoka

Journal:

Journal of Polymer Science Part B: Polymer Physics

Year:

1965

Language:

english

File:

PDF, 317 KB

english, 1965

13

Fluorine-containing photoreactive polyimide. 7. Photochemical reaction of pendant 1,2-naphthoquinone diazide moieties in novel photoreactive polyimides

Omote, Toshihiko, Mochizuki, Hideaki, Koseki, Ken'ichi, Yamaoka, Tsuguo

Journal:

Year:

1990

Language:

english

File:

PDF, 710 KB

english, 1990

14

Novel dual-mode photoresist based on cationic polymerization and acidolysis

Moon, Seongyun, Naitoh, Kazuhiko, Yamaoka, Tsuguo

Journal:

Chemistry of Materials

Year:

1993

Language:

english

File:

PDF, 1.34 MB

english, 1993

15

Fluorine-containing photoreactive polyimide. 6. Synthesis and properties of a novel photoreactive polyimide based on photo-induced acidolysis and the kinetics for its acidolysis

Omote, Toshihiko, Koseki, Ken'ichi, Yamaoka, Tsuguo

Journal:

Year:

1990

Language:

english

File:

PDF, 1.68 MB

english, 1990

16

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Aqueous base developable novel deep-UV resist for KrF excimer laser lithography

Murata, Makoto, Takahashi, Toshihiko, Koshiba, Mitsunobu, Kawamura, Shin-ichi, Yamaoka, Tsuguo, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 245 KB

english, 1990

17

Photosensitive Polyimide Protected by Tetrahydropyranyl Group Based on Chemical Amplification.

Naitoh, Kazuhiko, Ishii, Kazuhisa, Yamaoka, Tsuguo, Omote, Toshihiko

Journal:

Journal of Photopolymer Science and Technology

Year:

1992

Language:

english

File:

PDF, 221 KB

english, 1992

18

APPLICATION OF PHOTOSENSITIVE SILICONE-CONTAINING GRAFT POLYMERS SYNTHESIZED FROM MACROMONOMER TO MICRO LITHOGRAPHY

TACHIBANA, Yoshio, YASUDA, Yasutaro, KOSEKI, Ken-ichi, YAMAOKA, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

1988

Language:

english

File:

PDF, 74 KB

english, 1988

19

Pyrromethene Dye Sensitized Photopolymer and the Application to Visible Laser Direct Imaging

Suzuki, Shota, Urano, Toshiyuki, Ito, Katsuhiro, Murayama, Toshikazu, Hotta, Iwao, Takahara, Shigeru, Yamaoka, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

2004

File:

PDF, 479 KB

2004

20

Recent developments and difficulties of photosensitive polyimides.

Yamaoka, Tsuguo, Omote, Toshihiko

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 287 KB

english, 1993

21

Preparation and properties of soluble and colorless fluorine-containing polyimide precursors

Omote, Toshihiko, Koseki, Ken'ichi, Yamaoka, Tsuguo

Journal:

Journal of Photopolymer Science and Technology

Year:

1988

Language:

english

File:

PDF, 76 KB

english, 1988

22

Effect of residual solvent on pattern profile and mechanical characteristic of photosensitive polyimides.

Nishiki, Masashi, Kousaka, Akihiro, Yamaoka, Tsuguo, Koizumi, Shigeru

Journal:

Journal of Photopolymer Science and Technology

Year:

1995

Language:

english

File:

PDF, 136 KB

english, 1995

23

Tetrahydropyranyl-protected poly( p -hydroxystyrene) containing vinyl ether compound for three-component photopolymers

Soyoung Song, Shunping Chang, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

1998

Language:

english

File:

PDF, 382 KB

english, 1998

24

Study of radical generated from coumarin dye-sensitized photo-initiator systems in high-speed photopolymer coating layers using laser flash photolysis

Toshiyuki Urano, Etsuko Hino, Hiroto Ito, Makoto Shimizu, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

1998

Language:

english

File:

PDF, 136 KB

english, 1998

25

Photopolymerization mechanisms of acrylates in poly(methyl methacrylate) films

Toshiyuki Urano, Hideki lto, Keiji Takahama, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

1999

Language:

english

File:

PDF, 114 KB

english, 1999

26

Sensitization mechanisms from excited-singlet state of pyrromethene dye to a radical-generating reagent in a poly(methylmethacrylate) film

Toshiyuki Urano, Hideki Ito, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

1999

Language:

english

File:

PDF, 213 KB

english, 1999

27

Water-dispersible microgel modified with methacryloyl groups by ionic bonding on the surface and the photopolymer microgel

Takanori Takahashi, Kazuhiro Ikegaya, Hirohmi Watanabe, Nobukazu Miyagawa, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

2000

Language:

english

File:

PDF, 295 KB

english, 2000

28

Surface-activated photopolymer microgels

Dr. Nobumasa Sasa, Prof. Tsuguo Yamaoka

Journal:

Advanced Materials

Year:

1994

Language:

english

File:

PDF, 593 KB

english, 1994

29

[2.2](4,4′)Azobenzolophan

Nobuyuki Tamaoki, Dr. Kenichi Koseki, Prof. Dr. Tsuguo Yamaoka

Journal:

Angewandte Chemie

Year:

1990

Language:

german

File:

PDF, 222 KB

german, 1990

30

[2.2](4,4′)Azobenzenophane

Nobuyuki Tamaoki, Dr. Kenichi Koseki, Prof. Dr. Tsuguo Yamaoka

Journal:

Angewandte Chemie International Edition

Year:

1990

Language:

english

File:

PDF, 264 KB

english, 1990

31

Dynamic mechanical properties of photopolymerizable poly(vinyl alcohol)–acrylate monomer blends

Mitsunobu Koshiba, Tsuguo Yamaoka, Takahiro Tsunoda

Journal:

Journal of Applied Polymer Science

Year:

1983

Language:

english

File:

PDF, 442 KB

english, 1983

32

Sensitivity and sensitization mechanism of halomethylated polystyrene to near UV region

Yu-Chuan Zhang, Hiroshi Morita, Tsuguo Yamaoka

Journal:

Journal of Applied Polymer Science

Year:

1986

Language:

english

File:

PDF, 526 KB

english, 1986

33

Preparation and properties of soluble and colorless fluorine-containing photoreactive polyimide precursors

Toshihiko Omote, Tsuguo Yamaoka, Kenichi Koseki

Journal:

Journal of Applied Polymer Science

Year:

1989

Language:

english

File:

PDF, 600 KB

english, 1989

34

Magnetic filed effect on sensitized photocrosslinking reaction of azidomethylated polytsyrene

Hiroshi Morita, Noriaki Uchino, Yasuhiro Nakamura, Tsuguo Yamaoka

Journal:

Journal of Applied Polymer Science

Year:

1989

Language:

english

File:

PDF, 533 KB

english, 1989

35

Fluorine-containing photoreactive polyimide. II. Preparation and properties of self-sensitized polyimide precursors

Toshihiko Omote, Guo-jin, Ken'ichi Koseki, Tsuguo Yamaoka

Journal:

Journal of Applied Polymer Science

Year:

1990

Language:

english

File:

PDF, 964 KB

english, 1990

36

Fluorine-containing photoreactive polyimides, 3. A positive-working polyimide containing o-naphthoquinonediazide moieties in the polymer side chain

Toshihiko Omote, Hideaki Mochizuki, Ken'ichi Koseki, Tsuguo Yamaoka

Journal:

Macromolecular Rapid Communications

Year:

1989

Language:

english

File:

PDF, 292 KB

english, 1989

37

A study on phenoxy-resin esters of cinnamylideneacetic acid and its derivatives

Tsuguo Yamaoka, Koji Ueno, Takahiro Tsunoda, Kazuo Torige

Journal:

Year:

1977

Language:

english

File:

PDF, 410 KB

english, 1977

38

Negative resists of silicone-containing graft polymer for bilayer resist system

Yoshio Tachibana, Yasutaro Yasuda, Tetsuji Jitsumatsu, Ken'ichi Koseki, Tsuguo Yamaoka

Journal:

Year:

1990

Language:

english

File:

PDF, 594 KB

english, 1990

39

Acid hardenable, spin-coatable silicon ladder polymer systems as resist materials

Hiroyuki Hiraoka, Tsuguo Yamaoka

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 271 KB

english, 1991

40

Triplet state electron transfer pathway for tetrabenzoporphyrin-diphenyliodonium salt photoinitiator system

Madoka Yasuike, Motoyuki Shima, Ken'ichi Koseki, Tsuguo Yamaoka, Masako Sakuragi, Masako Sakuragi, Kunihiro Ichimura

Journal:

Journal of Photochemistry and Photobiology A: Chemistry

Year:

1992

Language:

english

File:

PDF, 597 KB

english, 1992

41

On the cleavage process of the N-trifluoromethylsulfonyloxy-1,8-naphthalimide photoacid generator

Jean-Pierre Malval, Fabrice Morlet-Savary, Xavier Allonas, Jean-Pierre Fouassier, Shota Suzuki, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Chemical Physics Letters

Year:

2007

Language:

english

File:

PDF, 320 KB

english, 2007

42

Interaction mechanism in pyrromethene dye/photoacid generator photosensitive system for high-speed photopolymer

Shota Suzuki, Xavier Allonas, Jean-Pierre Fouassier, Toshiyuki Urano, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Journal of Photochemistry and Photobiology A: Chemistry

Year:

2006

Language:

english

File:

PDF, 479 KB

english, 2006

43

Three-component photo radical initiating system—the effect of 2-mercaptobenzothiazole as a co-initiator in polymer matrix

Shota Suzuki, Perrier Emilie, Toshiyuki Urano, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Year:

2005

Language:

english

File:

PDF, 562 KB

english, 2005

44

Optical and redox properties of meso-diphenyltetrabenzoporphyrins

Madoka Yasuike, Tsuguo Yamaoka, Osamu Ohno, Kunihiro Ichimura, Hisayuki Morii, Masako Sakuragi

Journal:

Inorganica Chimica Acta

Year:

1991

Language:

english

File:

PDF, 923 KB

english, 1991

45

Singlet oxygen generation by tetrabenzoporphyrins as photosensitizer

Madoka Yasuike, Tsuguo Yamaoka, Osamu Ohno, Masako Sakuragi, Kunihiro Ichimura

Journal:

Inorganica Chimica Acta

Year:

1991

Language:

english

File:

PDF, 466 KB

english, 1991

46

[2.2](4,4' )Azobenzenophane. synthesis, structure, and cis-trans isomerization

Nobuyuki Tamaoki, Koreharu Ogata, Kenichi Koseki, Tsuguo Yamaoka

Journal:

Year:

1990

Language:

english

File:

PDF, 652 KB

english, 1990

47

The photo- and thermal cis-trans isomerization of [23](4,4′)azobenzenophane

Nobuyuki Tamaoki, Kenichi Koseki, Tsuguo Yamaoka

Journal:

Tetrahedron Letters

Year:

1990

Language:

english

File:

PDF, 256 KB

english, 1990

48

Photosensitizer efficacy of non-peripheral substituted alkylbenzopyridoporphyrazines for photodynamic therapy of cancer

Keiichi Sakamoto, Taku Kato, Tomomi Kawaguchi, Eiko Ohno-Okumura, Toshiyuki Urano, Tsuguo Yamaoka, Shota Suzuki, Michael J Cook

Journal:

Journal of Photochemistry and Photobiology A: Chemistry

Year:

2002

Language:

english

File:

PDF, 228 KB

english, 2002

49

Mechanistic investigations of the photosensitized reactions of iron arene complexes

Takashi Karatsu, Yukio Shibuki, Nobukazu Miyagawa, Shigeru Takahara, Akihide Kitamura, Tsuguo Yamaoka

Journal:

Journal of Photochemistry and Photobiology A: Chemistry

Year:

1997

Language:

english

File:

PDF, 1.11 MB

english, 1997

50

Application of photopolymer to core-hair type microgels with various hair length

Takanori Takahashi, Hiroomi Watanabe, Nobukazu Miyagawa, Shigeru Takahara, Tsuguo Yamaoka

Journal:

Polymers for Advanced Technologies

Year:

2002

Language:

english

File:

PDF, 203 KB

english, 2002